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Wafers and Substrates

LN, LT, Quartz Ultra Thin Film and Wafers

Shalom EO's Thin Films on Insulator Wafers consists of nanoscale thin films of LN (Lithium Niobate), LT (Lithium Tantalate), or Quartz combined with Silicon insulation substrates. These thin film wafers are of extensive application fields and could be used as high-speed resonators, surface acoustic wave (SAW) filters, EO modulators, integrated nanophotonics, etc. Instead of bulk substrates, thin film wafers are more advantageous in terms of compactness, higher performance, lower costs, and the potential to innovate new designs.

Shalom EO offers various kinds of thin film on insulator wafers. Specifications include 300-900nm LiNbO3/LiTaO3 ultra-thin films, 5-50um LiNbO3/LiTaO3/Quartz thin films, and free-standing LiTaO3 thin film wafers. (Note that the 300-900nm and 5-50um here refer to the thickness of the top function layers, where the thickness of the optional isolation layer, electrode layer, and silicon substrate are not counted.)

Lithium Niobate (LiNbO3) is a versatile and excellent material with high nonlinearities and exclusive electro-optic, acoustic-optic, and piezoelectric properties. Furthermore, in recent years, the development of Thin Film Lithium Niobate, or Lithium Niobate on Insulator (LNOI) has brought a radical breakthrough in the field of integrated photonics. The LNOI features low insertion losses, and reliable stabilities, are exquisite when used to manufacture high-speed electro-optical modulators and high-performance SAW filters, and are fit for application contexts such as data centers, long-distance data transmission, mobile phones, base stations, etc. Lithium tantalate (LiTao3) has excellent piezoelectric and pyroelectric properties and LTOI is utilized to manufacture RF front-end filters and pyroelectric infrared detectors.

Various sizes and orientations of the wafers and substrates could be tailored upon your request.