Si (Silicon)
Silicon is used as an optical window primarily in the 3 to 5 micron band and as a substrate for production of optical filters. Large blocks of Silicon with polished faces are also employed as neutron targets in Physics experiments.
Physical and optical properties
Transmission Range : | 1.2 to 15 μm (1) |
Refractive Index : | 3.4223 @ 5 μm (1) (2) |
Reflection Loss : | 46.2% at 5 μm (2 surfaces) |
Absorption Coefficient : | 0.01 cm-1 at 3 μm |
Reststrahlen Peak : | n/a |
dn/dT : | 160 x 10-6 /°C (3) |
dn/dμ = 0 : | 10.4 μm |
Density : | 2.33 g/cc |
Melting Point : | 1420 °C |
Thermal Conductivity : | 163.3 W m-1 K-1 at 273 K |
Thermal Expansion : | 2.6 x 10-6 / at 20°C |
Hardness : | Knoop 1150 |
Specific Heat Capacity : | 703 J Kg-1 K-1 |
Dielectric Constant : | 13 at 10 GHz |
Youngs Modulus (E) : | 131 GPa (4) |
Shear Modulus (G) : | 79.9 GPa (4) |
Bulk Modulus (K) : | 102 GPa |
Elastic Coefficients : | C11=167; C12=65; C44=80 (4) |
Apparent Elastic Limit : | 124.1MPa (18000 psi) |
Poisson Ratio : | 0.266 (4) |
Solubility : | Insoluble in Water |
Molecular Weight : | 28.09 |
Class/Structure : | Cubic diamond, Fd3m |
Refractive Index
No = Ordinary Ray
µm | No | µm | No | µm | No |
1.357 | 3.4975 | 1.367 | 3.4962 | 1.395 | 3.4929 |
1.5295 | 3.4795 | 1.660 | 3.4696 | 1.709 | 3.4664 |
1.813 | 3.4608 | 1.970 | 3.4537 | 2.153 | 3.4476 |
2.325 | 3.4430 | 2.714 | 3.4358 | 3.000 | 3.4320 |
3.303 | 3.430 | 3.500 | 3.4284 | 4.000 | 3.4257 |
4.258 | 3.4245 | 4.500 | 3.4236 | 5.000 | 3.4223 |
5.500 | 3.4213 | 6.000 | 3.4202 | 6.500 | 3.4195 |
7.000 | 3.4189 | 7.500 | 3.4186 | 8.000 | 3.4184 |
8.500 | 3.4182 | 10.00 | 3.4179 | 10.50 | 3.4178 |
11.04 | 3.4176 |
Product Notes
Silicon is grown by Czochralski pulling techniques (CZ) and contains some oxygen which causes an absorption band at 9 microns. To avoid this, Silicon can be prepared by a Float-Zone (FZ) process. Optical Silicon is generally lightly doped ( 5 to 40 ohm cm) for best transmission above 10 microns. Silicon has a further pass band 30 to 100 microns which is effective only in very high resistivity uncompensated material. Doping is usually Boron (p-type) and Phosphorus (n-type).
Tags: Si (Silicon)