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  • Si(Silicon) Crystals and Substrates
  • Si(Silicon) Crystals and Substrates

Si(Silicon) Crystals and Substrates


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Specifications:

Orientation <100>, <110>, <111> Size(mm) 10×3, 10×5, 10×10, 15×15, 20×15
Thickness 0.5mm, 1.0mm Size Tolerance <±0.1mm
Thickness Tolerance <±0.015mm(special in<±0.005mm) Polishing SSP (single surface polished) or
DSP (double surface polished)
Redirection Precision ±0.5° Redirection the Edge 2°(special in 1°)

 

Basic Properties:

Crystal Structure M3 Melt Point(℃) 1420
Density(g/cm3) 2.4    
Doped Material No b-doped p-doped
Type Ⅰ P N
Resistivity >1000Ωcm 10-3~104Ωcm 10-3~104Ωcm
EPD ≤100∕cm2 ≤100∕cm2 ≤100∕cm2
O Content (/cm3) ≤1~1.8×1018 ≤1~1.8×1018 ≤1~1.8×1018
C Content (/cm3) ≤5×1016 ≤5×1016 ≤5×1016

Single Crystal Silicon for solar energy applications includes p-type and n-type silicon. Ultra high purity silicon is used in the semiconductor industry as a result of its semiconducting properties. Silicon is also used as an alloying element in the manufacture of certain alloys (e.g. ferrosilicon, an alloy of iron and silicon which is used to introduce silicon into steel and cast iron). Single Crystal Silicon is generally immediately available in most volumes.