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300-900nm Lithium Niobate Thin Films (LNOI)

  • High electro-optic,nonlinear optic, electro-mechanical coefficients
  • Diameters: 3” and 4”
  • Top functional layer ultra-thin thickness: 300-900nm
  • Versions with SiO2 isolation layers, Silicon/LN/Quartz/Fused Silica substrates are available
  • Applications:  data centers, long-distance data transmission, mobile phones, base stations, etc.
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Top Functional Layer
Diameter 3, 4 inches
Orientation X-Cut, Z-Cut
Material LiNbO3 or MgO: LiNbO3
Thickness 300-900 nm (Typical 300nm, 600nm, 700nm)
Isolation Layer
Material SiO2
Thickness 1000-4000nm
Material Si, LN, Quartz, Fused Silica etc.
Thickness 400-600μm (Typical 500μm, 525

Lithium Niobate on Insulator (LNOI) are lithium niobate (LiNbO3) nano-scale thin films, oriented for the usage of POI (Piezoelectric On Insulator) including high-speed modulators, high Q factor SAW devices, and integrated nanophotonics. 

Lithium Niobate is a versatile and excellent material with high nonlinearities, and exclusive electro-optic, acousto-optic, and piezoelectric properties. Furthermore, in recent years, the development of Thin Film Lithium Niobate, or Lithium Niobate on Insulator (LNOI) has brought a radical breakthrough in the field of high-density integrated photonics.

The performance of bulk lithium niobate is limited to a great extent, with the confinement of signal qualities, insertion loss, bandwidth, etc. Whilst LNOI has elevated the upper limit. Devices made utilizing Thin Film LiNbO3 outperform their counterparts using bulk LiNbO3. Thin Film LiNbO3 reduces the detrimental free-carrier effect, yielding the advantages of broad bandwidth, data transfer rates, compliance with CMOS voltage drivers, and better thermal conduction. LNOI is also a promising technique to manufacture ultra-low loss resonators for optomechanics of high frequencies, which conform with the market trends toward wide bandwidth and high radio frequencies for the next generation. 

With the development of matured nanofabrication techniques, Shalom EO is capable of providing nano-scale 300-900nm Lithium Niobate Thin Films (LNOI). Our LiNbO3 thin films consist of a top functional ultra-thin film of Lithium Niobate, a supporting substrate made from Silicon/Quartz/Lithium Niobate/Fused Silica, and an optional SiO2 isolation section. The LNOI feature compact dimensions, low insertion losses, reliable stabilities, and are exquisite when used to manufacture high-speed electro-optical modulators, and high-performance SAW filters, and are fit for application contexts such as data center, long-distance data transmission, mobile phones, base stations, etc.

LNOI structure style=

Figure 1. Shows the structure of a Lithium Niobate Thin Film/LNOI.