click me!

300-900nm Lithium Niobate On Insulator (LNOI)

  • High electro-optical, nonlinear optical, electro-mechanical coefficients
  • Diameters: 3”, 4", 6", 8"
  • Top functional layer ultra-thin thickness: 300-900nm
  • Versions with optional SiO2 isolation layers and Si/LN/Quartz/Fused Silica substrates are available
  • Applications:  data centers, long-distance data transmission, mobile phones, base stations, etc.
Inquire Us  
Layers Parameter Specifications
Top Functional Layer Material Lithium Niobate
Diameter 3” 4” 6” 8”
Surface Orientation X-cut or according to request
Primary Flat Orientation according to request
Secondary Flat Orientation according to request
Film Thickness 300-600nm
Front Side Finish Optical Polished
Isolation Layer Buried Oxide Avg. Thickness 4600nm 4700nm 4800nm /
Buried Oxide Thickness Uniformity -5% 0% 5% /
Support Substrate Material Si, Ln, Sapphire, Quartz, etc.
Diameter 3” 4” 6” 8”
Thickness 0.525mm 0.525mm 0.675mm 0.725mm
Growth Method CZ CZ ZVD Hydrothermal
Orientation {100}   0.5 deg.
Dopant   Phos    
Surface Finish     10 nm

Lithium Niobate on Insulator (LNOI) Lithium niobate on insulator (LNOI) is a promising platform for integrated photonics. It involves transferring thin films of lithium niobate onto insulating substrates, such as silicon dioxide or silicon nitride. This technique allows for the integration of lithium niobate-based devices, which are known for their excellent electro-optical, nonlinear-optical (NLO), and piezoelectric properties, with existing silicon photonics platforms.

Lithium Niobate is a versatile and excellent material with high nonlinearities and exclusive electro-optical, and piezoelectric properties. Furthermore, in recent years, the development of Thin Film Lithium Niobate, or Lithium Niobate on Insulator (LNOI) has brought a radical breakthrough in the field of high-density integrated photonics.

One significant advantage of LNOI is its high electro-optical coefficient, which enables efficient modulation of light signals with low power consumption. This trait is essential for developing high-speed optical modulators used in data communication devices. In addition, the nonlinear optical properties of lithium niobate allow for the generation of new frequencies through processes such as second-harmonic generation and parametric amplification, enabling applications in wavelength conversion. Thin film LiNbO3 modulator reduces the detrimental free-carrier effect, delivering the advantages of compact size,  broad bandwidth, high data transfer rates, compliance with CMOS voltage drivers, and low power consumption. LNOI filters excel in wide bandwidth, high frequencies, better thermal conduction, and steadiness against temperature change. LNOI is also an excellent technique to manufacture ultra-low loss resonators for optomechanics of high frequencies, which conform with the market trends toward wide bandwidth and high radio frequencies for the next generation. 

With the development of matured nanofabrication techniques, Shalom EO is capable of providing nano-scale 300-900nm Lithium Niobate On Insulator (LNOI). Our LiNbO3 on insulator consists of a top functional ultra-thin film of Lithium Niobate with a thickness range of 300-900nm, a supporting substrate made from Silicon/Quartz/Lithium Niobate/Fused Silica, and an optional SiO2 isolation layer. The LNOI features low insertion losses, reliable stabilities, and are exquisite when used to manufacture high-speed electro-optical modulators, and high-performance SAW filters, and are fit for application contexts such as data centers, long-distance data transmission, mobile phones, base stations, etc.

LNOI structure style=

Figure 1. Shows the structure of a Lithium Niobate On Insulator/LNOI.