MgO Substrates

Twin-less crystal structure, low dielectric constant (9.65), and tiny loss at microwave band
Maximum Size: 50x50x30mm
Stocked and custom MgO substrates are available
Orientations:＜100＞,＜110＞ and ＜111＞
Surface Roughness: Ra < 0.5nm
Applications: Thin film growth of Ferro-magnetic, Photo-electronic, semiconductor, and high-temperature superconductor (HTSC) applications

Code	Size	Thickness	Orientation	Surface Finish	Unit Price	Delivery
641-001	5x5mm	0.5mm	<100>	SSP	Inquire	2 weeks
641-002	5x5mm	0.5mm	<100>	DSP	Inquire	2 weeks
641-003	5x5mm	0.5mm	<110>	SSP	Inquire	2 weeks
641-004	5x5mm	0.5mm	<111>	SSP	Inquire	2 weeks
641-005	10x10mm	0.5mm	<100>	SSP	Inquire	2 weeks
641-006	10x10mm	0.5mm	<100>	DSP	Inquire	2 weeks
641-007	10x10mm	0.5mm	<110>	SSP	Inquire	2 weeks
641-008	10x10mm	0.5mm	<111>	SSP	Inquire	2 weeks
641-009	Φ12.7mm	0.5mm	<100>	SSP	Inquire	2 weeks
641-010	Φ12.7mm	0.5mm	<100>	DSP	Inquire	2 weeks
641-011	Φ25.4mm	0.5mm	<100>	SSP	Inquire	2 weeks
641-012	Φ25.4mm	0.5mm	<100>	DSP	Inquire	2 weeks
641-013	Φ50.8mm	0.5mm	<100>	SSP	Inquire	2 weeks
641-014	Φ50.8mm	0.5mm	<100>	DSP	Inquire	Inquire

MgO (Magnesium Oxide Crystals), due to its low dielectric constant and minimal microwave band loss, along with the availability of large-sized wafers (up to 2 inches in diameter and larger), has emerged as a crucial industrial material for High-Temperature Superconductor (HTS) thin monocrystalline wafers. MgO serves as an exceptional single-crystal substrate catering to various thin film growth tasks including Ferro-magnetic, Photo-electronic, semiconductor, and high-temperature superconductor films. Its utility extends to III to V element research, exploring epitaxial effects on polymer crystallization, and even for depositing ferroelectric coatings on its substrates. Moreover, MgO wafers find increasing applications in Plasma Display Panel (PDP) technology.

Hangzhou Shalom EO provides both stocked standard MgO wafers and customized wafers.

Common Specifications:

Material	MgO crystals	Orientation	＜100＞,＜110＞,＜111＞
Orientation Error	±0.5°	Maximum Size	50x50mm
Typical Thickness	0.5mm, 1.0mm	Thickness Tolerance	±0.05mm
Size Tolerance	±0.1mm	Surface Finish	SSP or DSP
Roughness	Ra<0.5nm	Cleaness and Package	1000 grade clean room, 100 grade bags

MgO Properties:

Growth Method	Special Arc Melting	Crystallographic Structure	Cubic a = 4.13 Å
Twinning Structure	Twin free	Orientation	<100>, <110>, <111>
Colour	Colourless	Transmission Range	0.2 to 8 µm
Density	3. 585 g/cm³	Melting Point	2780 +/- 20 °C
Thermal Expansion Coefficient	11.2 * 10^-6 K^-1	Dielectric Constant	9.65
Specific Resistivity	> 10¹⁷Ohm/cm

Curves:

1）Typical X-Ray Diffraction (XRD) Curve of MgO <100> Crystals Substrates

2) Typical Surface Roughness of MgO substrate <100> and <010> measured by Atomic Force Microscope (AFM) in 5μm x 5μm Scale

MgO Substrates

MgO Wafers Φ25.4mmx0.5mm <100> DSP

MgO Wafers 10x10x0.5mm <100> DSP

MgO Wafers 5x5x0.5mm <100> SSP