|Density (at 25°C / 77°F)||2.201 g/cm^3|
|Shear Modulus||30.6 GPa|
|Young's Modulus||2.1 GPa|
|Bulk Modulus||37.4 GPa|
|Modulus of Rupture, abraded||52.4 MPa|
|Knoop Hardness (100g load)||522 kg/mm^2|
|Compressive Strength||1.14 GPa|
|Tensile Strength||54 MPa|
|Thermal Expansion Coefficients||0.52 ppm/K @5-35°C
0.57 ppm/K @0-200°C
0.48 ppm/K @-100 - 200°C
|Thermal Conductivity||1.38 W/m·K|
|Thermal Diffusivity||0.0075 cm^2/s|
|Specific Heat||0.770 J/g·K|
|Refractive Index||Nd = 1.45840 @589nm|
|Dielectric Constant||E = 3.8|
Caution: The presented is typical of commercially available Fused Silica and is offered for comparative purposes only. Please view the data sheets of the brands if you want to check the individual properties of each brand.
|Brands and Materials:||Corning :Fused silica 7980/7978/7979 etc. Made in China: Fused Silica JGS1, Single Crystal Quartz etc.|
|Diameters||Up to 450mm(4inch/6inch/8inch/12inch/350mm/450mm)|
|Thickness||Minimum 30μm(0.1mm/0.2mm/0.3mm/0.5mm/1mm etc)|
|Dimensional Tolerance||+/- 0.2mm|
|Thickness Tolerance||+/- 0.1mm|
|Thickness Variation(TTV)||< 2μm|
|Surface Roughness (Rz)||< 0.05μm|
|Surface Quality||40/20 S/D, or custom|
|Other customized specifications available|
Fused Silica and Optical Quartz Glass Wafers (or Substrates)are thin discs or square plates of variable dimensions or shapes made from Fused Silica or Quartz Glass. The terms Fused Silica, or Quartz Glass ( sometimes colloquially called Fused Quartz) are often used interchangeably, as both the names describe solids consisting of refined silica Silicon Dioxide, SiO2) in amorphous form gained through the rapid cooling of molten Silica to prevent the formation of crystalline structure. ( It is worth noting that SiO2 Wafers (or Substrates) could be interpreted as both the wafers made from non-crystalline quartz glass and the wafers made from single crystal quartz.)To further discriminate the terms, IR Grade Fused Silica (or Quartz Glass) more frequently refers to the material produced with a production method to deliberately reduce Hydroxyl(OH-) composition, subequently increase the transmission in IR band. One typical method is Chemical Vapor Deposition (CVD), where silicon-rich synthetic precursors (e.g. SiliconTetra Chloride, SiCl4) are heated into vapor, then oxidized and eventually obtain the deposition. And UV Grade Fused Silica is usually produced by fusing SiCl4 stones with high purity oxyhydrogen flame, therefore containing relatively higher Hydroxyl(OH) composition.
Generally, one distinctive feature of this family of SiO2 glass variants is that it has an extremely high melting point at approx. 1650℃ (that is, 3000 ℉), this not only implies difficulty in its fabrication, which consequently results in a higher price than the normal soda-lime glass but also contributes to its superior temperature handling ability (capable of withstanding temperature up to 1400℃. In fact, the material is more temperature-durable than any other of its glass counterparts. Other advantages of Fused Silica and Optical Quartz Glass include high optical transmission and chemical inertia (it is inert to almost all kinds of acid except hydrofluoric acid), impressively low thermal expansion, and excellent thermal shock resistance, radiation resistance, etc. The application fields are also very wide, encompassing Optical and Laser Systems, UV-light Sanitation, Semiconductors, Spacecraft, etc.
Hangzhou Shalom EO offers Fused Silica and Optical Quartz Glass Wafers (or Substrates) made from glass materials equivalent to the brands stated: Corning HPFS 7980/7979/7978, JGS1(Optical Quartz Glass). Large size and wafers and substrates are available with diameter capability up to 450mm and smooth surface with surface roughness < 5 Å. All the specifications could be customized at your request. Typically, Shalom EO is capable to provide Fused Silica and Optical Quartz Glass Wafers (or Substrates) suitable for applications listed below:
Features of brands:
Corning HPFS 7980/7979/7978:
Corning HPFS (High Purity Fused Silica) glass features low dispersion constants, splendid homogeneity grades, exceptional transparency across the UV, VIS, and IR zones, an ultra-low thermal expansion coefficient. While Corning 7980 UV Fused Silica performs great in the UV spectrum, Corning 7979 IR grade glass on the general has lower metallic and OH contents resulting in higher transmission during the MWIR zone. Corning 7978 is also a kind of IR-grade glass. Wafers and substrates made from Corning HPFS 7980/7979/7978 are particularly suitable for processing high-end optical components including Optical Lenses, Optical Windows, Optical Mirrors, etc.
JGS1 is a synthetic Optical Quartz Glass renowned for its UV transparent property, produced by melting SiCl4 stones with high purity oxyhydrogen flame and re-solidifying the melted substance.
Being an ideal Chinese substitute for Corning 7980 UV grade Fused Silica, it has excellent mechanical, thermal, chemical endurance, and are exceptionally suitable for applications in the wavelength range from 180nm to 2500nm, where the average transmission through UV and VIS spectrum is 90% and gets even higher when extended to the further UV range below 185nm. However, Due to its production method, a large amount of Hydroxyl (OH) of aprox. 2000pm are embedded, which results in dips on the transmission curve at 1400nm, 2200nm, and a strong absorption peak at 2700nm.
JGS1 provided by Shalom EO is similar to Heraeus Suprasil 1 and 2, Saint-Gobain Spectrosil A and B, Corning 7980, Dynasil’s 1100 and 4100.